Wafermap-Designs Based on Zernike Polynomials

In Semiconductor industries, homogeneity of the results of many process steps across the wafer is an essential goal and tightly correlated with the final yield. It is important to make a judgement of homogeneity based on a sample of points that is efficient: Typical deviation from “flatness” have to be detected with an affordable (i. e. small) number of test points on the wafer. Easy to interpret deviations from flatness can be described by Zernike
polynomials which are state of the art in describing optical deficiencies in the human eye or in adaptive optics. This report describes Zernike Polynomials and shows how the measuring points are optimally placed on the wafer surface using the statistical software Cornerstone.

    The fields marked with an asterisk (*) are mandatory.

    You can use this contact form to contact us. We will use your personal data only for the purpose of processing your query. Your contact request will be processed centrally within the camLine Group to ensure that your inquiry can be responded to as quickly and effectively as possible. More detailed information concerning the collection and processing of data in connection with this contact form is available in our Privacy Policy.


    From Saturday, October 16, 2021, 9 am CEST to approximately Sunday, October 17, 2021, 9 am CEST the camLine Support Portal will not be available. In urgent cases, please use your dedicated hotline number or +49 8137 6059 989.